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 Poromeric Polishing Pad |
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| These polishing pads are most suitable for mechanochemical polishing of silicon wafers. These pads are flexible, durable and delicate. The micro-layer construction of these pads provides strength and durability in production. Slurry squeezed from pores on polyurethane surface enables consistent high quality surface finishes. |
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| Cerium Pad |
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| These polyurethane pads have cerium oxide abrasive in the hard foam base material and are particularly effective for glass polishing. These pads are available with a variety of sizes and configurations including grooves, holes and backing adhesives for fast, easy machine set up. |
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| Cleaning Liquid |
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| For post lapping and polishing we can also provide cleaning solutions for removing liquids and abrasives which may adhere to the surfaces of your workpieces. |
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| Bellclean |
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| We also offer cleaning brushes made of soft PVA sponges in various sizes and shapes. These brushes are very flexible when used with water and remove surface contamination without damaging your parts. |
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